Nanoscale
21 May 2020
Ultrafast plasmonic lasing from a metal/semiconductor interface
Jian Wang,‡ab Xiaohao Jia,‡cd Zhaotong Wang,e Weilong Liu,f Xiaojun Zhu,f Zhitao Huang,cd Haichao Yu,g Qingxin Yang,f Ye Sun,e Zhijie Wang,*cd Shengchun Qu,cd Jie Lin,*ab Peng Jin*ab and Zhanguo Wangcd
a Center of Ultra-precision Optoelectronic Instrument Engineering, Harbin Institute of Technology, Harbin 150080, China
b Key Laboratory of Micro-systems and Micro-structures Manufacturing (Harbin Institute of Technology), Ministry of Education, Harbin 150080, China
c Key Laboratory of Semiconductor Materials Science and Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
d Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
e School of Instrumentation Science and Engineering, Harbin Institute of Technology, Harbin 150080, China
f Department of Physics, Harbin Institute of Technology, Harbin 150080, China
g Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215125, China
‡ These two authors contributed equally to this work.
10.1039/D0NR02330B
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